ASML and imec Launch High NA EUV Lithography Lab

ASML and imec have recently unveiled a groundbreaking initiative in the semiconductor industry by establishing a European joint lab dedicated to High NA EUV lithography. This collaboration aims to provide an early development platform for leading-edge semiconductor companies seeking to leverage the potential of this cutting-edge technology.

The joint ASML-imec High NA EUV Lithography Lab, located in the Netherlands, represents a significant milestone in the advancement of High NA EUV lithography towards mass manufacturing. By addressing commercial objections and demonstrating the feasibility of this technology, the lab is poised to revolutionize the semiconductor landscape.

While some chip makers have expressed concerns about the cost and necessity of high NA EUV lithography for future process technologies, others like Intel have already made substantial investments in this area. Intel's acquisition of a high NA EUV system and commitment to utilizing ASML's capacity for upcoming production cycles underscore the industry's growing interest in this transformative technology.

The development of the High NA EUV Lithography Lab has been a multi-year endeavor, culminating in the availability of the first prototype High NA EUV scanner (TWINSCAN EXE:5000) and associated processing and metrology tools. This state-of-the-art facility is now open to leading logic and memory chip manufacturers, as well as suppliers of advanced materials and equipment, offering them a unique opportunity to explore the potential of High NA EUV lithography.

By granting access to the 0.55 NA EUV prototype scanner and complementary tools such as coat and development tracks, metrology systems, and handling equipment, imec and ASML aim to de-risk the technology and facilitate the development of customized High NA EUV applications. This collaborative effort is expected to drive innovation and pave the way for the widespread adoption of High NA EUV lithography.