UK opens first sub-5nm e-beam lithography centre outside Japan

The University of Southampton has recently unveiled the first e-beam lithography center outside of Japan with the capability to achieve resolutions under 5nm. This cutting-edge E-beam lithography (EBL) facility is only the second in the world to utilize a 200kV system, specifically the JEOL JBX-8100 G3. While foundries like Skywater in the US do employ lower power e-beam lithography for small volume production, the high acceleration voltage of the JEOL system enables the processing of fine structures with resolutions below 5nm on 200mm wafers.

This breakthrough can be accomplished even in thick resist, up to 10μm, resulting in nearly vertical sidewalls that are crucial for advancing new structures in research chips within the realms of electronics and photonics. Plans are already in place for a second EBL tool, the 100kV JEOL JBX-A9, to further support the utilization of higher volume 300 mm wafers.

The JEOL Accelerating Voltage Direct Writing Electron Beam Lithography (EBL) System is housed within an 820m2 cleanroom in the Mountbatten Complex at the University of Southampton. Professor Martin Charlton of the university expressed his excitement, stating, “We are highly privileged to be the first facility outside Japan to host this next-generation 200KV Electron Beam Lithography System. Southampton has over 30 years of experience in electron beam lithography.”

Prof. Charlton further emphasized the potential impact of this technology, saying, “This will help catapult developments in the fields of quantum computing, silicon photonics, and next-generation electronic systems. The equipment is complemented by our existing suite of microfabrication equipment, enabling research, development, and production of a diverse range of integrated nano-scale devices for electronics, photonics, and bio-nano technology.”

Science Minister Lord Vallance also commended the new facility, stating, “Britain is home to some of the most exciting semiconductor research anywhere in the world – and Southampton’s new E-beam facility is a major boost to our national capabilities.” The minister highlighted the importance of investing in infrastructure and talent to support researchers and innovators in developing next-generation chips within the UK.

Professor Graham Reed, who leads the Optoelectronics Research Centre (ORC) and Cornerstone photonics foundry, expressed his enthusiasm, stating, “The introduction of the new E-Beam facility will reinforce our position of hosting the most advanced cleanroom in UK academia. It facilitates a vast array of innovative and industrially relevant research, and much-needed semiconductor skills training.”