Toshiba and Rohm, two major Japanese companies, have announced a joint investment of $2.7 billion in power integrated circuits (ICs). This move aims to strengthen their positions in the semiconductor industry and enhance Japan's international competitiveness.
Rohm will contribute $2 billion towards the establishment of a silicon carbide (SiC) plant in Kyushu, while Toshiba will invest $700 million in a fabrication facility in Ishikawa. Both companies will sell the output of these facilities under their respective brands, leveraging their individual strengths and market presence.
The Japanese Ministry for Economics Trade and Industry (METI) has also pledged its support for these projects by providing $900 million in funding. This financial backing from the government reflects the importance of the semiconductor industry in driving economic growth and technological advancement.
"It is essential that domestic power semiconductor manufacturers collaborate to improve Japanese industry's international competitiveness," stated Economy Minister Yasutoshi Nishimura during a press conference. This sentiment highlights the significance of cooperation among Japanese companies to maintain a strong presence in the global market.
This investment comes on the heels of Rohm's recent involvement in a consortium led by JIP (Japan Industrial Partners) to privatize Toshiba. Rohm's $2 billion investment in this consortium demonstrates its commitment to supporting Toshiba's growth and ensuring the long-term success of the company.